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|
Sr. No. |
Item |
Description |
|
1 |
Company Name |
Jinhong Gas Co., Ltd. |
|
2 |
Website |
www.jh-gas.com |
|
3 |
Established Date |
1999 |
|
4 |
Headquartered |
China |
|
5 |
Market Position/ History |
Established in 1999 Jinhong Gas Co., Ltd. is a leading player in China’s gas industry and has developed into a high-tech enterprise specializing in gas R & D, production, sales and service. Dozens of subsidiaries are distributed nationwide, and their business is deeply rooted in the Yangtze River Delta and extended to the whole country. Its product portfolio comprises of mainly three categories including special gas, bulk gas and natural gas, and flexible gas supply mode. In 2020, JinHong Gas listed at ShangHai Stock Exchange set up a national enterprise center. |
|
6 |
Sales Area |
Worldwide |
|
7 |
Manufacturing Location |
China |
|
8 |
Ticker |
SHA: 688106 |
|
9 |
Competitors |
|
|
10 |
Chairman |
Jin Xianghua |
|
11 |
Ownership Type |
Public |
|
12 |
Contact Information |
No.6 Anmin Road, Xiangcheng Borough, Suzhou, Jiangsu, China Phone: +86 18451003260 Tel: +86-512-65767715-8880 |
Jinhong Gas Co., Ltd. is leading player in China’s gas industry with product offering comprising of special gas, bulk gas and natural gas, and flexible gas supply mode. The company offers various solutions including mixture gases, rare gases, related equipment and on site gas supply. Jinhong Gas provides comprehensive gas solutions of all types of specialty gas, bulk gas and LNG. The major gases produced by the company are Ammonia, Nitrous Oxide, Silane, Argon, and Carbon Dioxide catering to customer across multiple sectors including Semiconductor, IC, Photovoltaic, Infrastructure, etc. The specialty gas segment of the company includes Ammonia, Silane, Nitrous oxide, and octafluorocyclobutane which are majorly used as etching gases in semiconductor and material film production segment.
|
Product |
Product Description |
|
OCTAFLUOROCYCLOBUTANE |
Application: widely used in the manufacture of semiconductor devices. It can be used as a fluorine source in etching, cleaning and deposition processes, and as a raw material for preparing thin films. In addition, C4F8 can also be used to prepare ultra-thin films, such as submicron photoresist films and packaging materials for LCD. |
|
Nitrogen Trifluoride & Sulfur Hexafluoride |
Application: Both are used as a plasma etching gas |
|
Hydrofluoric Acid |
Application: extensively used in petroleum refining, pharmaceutical production, the synthesis of high-purity inorganic substances and organic fluorocompounds, and glass etching. |
|
Oxygen |
Application: High purity oxygen is used for the formation of silicon dioxide and metal oxide, as an etchant for photoresist, and in mixtures with halocarbons for etching silicon. |
|
Argon |
Application: Argon is used as a carrier gas in sputtering, plasma etching and ion implantations, and as a blanket atmosphere in crystalgrowth. |
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