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|
Sr. No. |
Item |
Description |
|
1 |
Company Name |
Air Liquide |
|
2 |
Website |
www.airliquide.com |
|
3 |
Established Date |
1902 |
|
4 |
Headquartered |
France |
|
5 |
Market Position/ History |
Air Liquide is present in 78 countries and headquartered at France. It was established in 1902. It provides gases, technologies and services for Industry and Health. The company has wide range of distribution channel to the different regions all over the world such as Asia, South America, Oceania and others. |
|
6 |
Sales Area |
Worldwide |
|
8 |
Ticker |
EPA: AI |
|
9 |
No. of Employees |
67,100 |
|
10 |
Competitors |
|
|
11 |
CEO |
François Jackow |
|
12 |
Ownership Type |
Public |
|
13 |
Contact Information |
Air Liquide 75, quai d’Orsay 75007 Paris France RCS: Paris 552 096 281 Greffe de PARIS Tel: +33 40 62 55 55 191, Silom Complex Building,19th Floor, Unit 1-2, Silom Road, Kwaeng Silom, Khet Bangrak, Bangkok 10500 Tel: +66 2635 1600 |
Air Liquide Company segmented into gas & services which includes healthcare, electronics, engineering & construction, semiconductors and others. The company assist different industries such as aeronautics, automotive, beverage, chemicals, food & beverage, waste water treatment and others. The etching gases included in semiconductor market are Ammonia, sulfur hexafluoride and Silane.
|
Product |
Product Description |
|
Ammonia |
Application: Ammonia takes part of deposit silicon nitride by Chemical Vapor Deposition (CVD) in semiconductor and advanced materials manufacturing. |
|
Sulfur hexafluoride |
Application: can be used for etching metal silicides, nitrides and oxides versus their metal substrates. It is also used in display fabrication for the cleaning of the Chemical Vapour Deposition (CVD) reactors. |
|
Silane |
Application: Silane is used in semiconductor manufacturing for polysilicon and epitaxial silicon deposition. It is an intermediate for the production of high purity silicon used in photovoltaic cells and semiconductors. |
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