Company Profile
Messer Group Basic Information, Manufacturing Base, Sales Area, and Competitors
|
Sr. No. |
Item |
Description |
|
1 |
Company Name |
Messer Group |
|
2 |
Website |
www.messergroup.com |
|
3 |
Established Date |
1898 |
|
4 |
Headquartered |
Germany |
|
5 |
Market Position/ History |
It was founded in 1898 and is headquartered in Germany. Messer supplies medical and pharmaceutical gases and turnkey solutions with gases used in industry, environmental protection, medicine, the food and beverage sector, welding and cutting technology, 3D printing, construction, and research and science. |
|
6 |
Sales Area |
Worldwide |
|
7 |
Manufacturing Location |
Germany |
|
8 |
No. of Employees |
11,259 (as of December 31, 2022) |
|
9 |
Competitors |
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|
10 |
CEO |
Bernd Eulitz |
|
11 |
Ownership Type |
Private |
|
12 |
Contact Information |
Messer-Platz 165812 Bad Soden Tel: +49 6196 7760 200 |
Business Segment/ Overview:
Messer Group is a one of the largest privately managed specialist for industrial, medical and specialty gases. It product offering includes gases used in industry, environmental protection, medicine, the food and beverage sector, welding and cutting technology, 3D printing, construction, and research and science. Apart from these product solutions company is also engaged in providing medical and pharmaceutical gases and turnkey solutions. The etching gas segement of the company comprises of SULFUR HEXAFLUORIDE, TETRAFLUOROMETHANE and OCTAFLUOROPROPANE
High Purity Etching Gas Product Types Specification
|
Product |
Product Description |
|
SULFUR HEXAFLUORIDE |
Application: High purity SF6 is utilized in two main plasma treatment processes in the semiconductor industry: SF6 plasma etch of wafers and SF6 plasma cleaning of vacuum chambers. |
|
TETRAFLUOROMETHANE |
Application: CF4 plasma etching of wafers and CF4 plasma cleaning of vacuum chambers. In particular, the capabilities for an efficient CF4 etch process are exploited due to the high Fluorine-to-Carbon ratio (4:1) |
|
OCTAFLUOROPROPANE |
Application: C3F8 plasma etching of wafers and C3F8 plasma cleaning of vacuum chambers. Octafluoropropane can be utilized in various etch processes, e.g. for selective C3F8 plasma etching of Silicon Dioxide or as an etching agent for Reactive Ion Etching. |
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Profile Details
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Author Anushka Gore
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Published 10 Jul 2024
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Last Updated 27 Jul 2024
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Reading Time~5 minutes
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CoverageSWOT, Financials, Key Employees, History
Table of Contents
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- 1.1 About Messer Group
- 1.2 Key Facts
- 1.3 Key Employees
- 1.3.1 Key Employee Biographies
- 1.4 History
- 1.5 Locations & Subsidiaries
- 1.5.1 Head Office
- 1.5.2 Other Locations & Subsidiaries
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- 2.1 Company Overview
- 2.2 Business Segments
- 2.3 R&D Overview
- 2.4 Brands
- 2.5 Key Company Statistics
- 2.6 Key Financials (2015–2019)
- 2.7 Share Holder Analysis
- 2.8 Regional Presence
- 2.9 Services Offered
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- 3.1 Strengths
- 3.2 Weaknesses
- 3.3 Opportunities
- 3.4 Threats
- 3.5 Key Competitors
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- 4.1 Company Metrics
- 4.2 Key Investors
- 4.3 Recent Funding & Valuation
- 4.4 Historical Funding & Valuation
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- 5.1 Acquisitions
- 5.2 Partnerships
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- 6.1 Latest News & Announcements
- 6.2 Strategic Initiatives
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- 7.1 Summary of Findings
- 7.2 Strategic Recommendations
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