Messer Group Basic Information, Manufacturing Base, Sales Area, and Competitors
|
Sr. No. |
Item |
Description |
|
1 |
Company Name |
Messer Group |
|
2 |
Website |
www.messergroup.com |
|
3 |
Established Date |
1898 |
|
4 |
Headquartered |
Germany |
|
5 |
Market Position/ History |
It was founded in 1898 and is headquartered in Germany. Messer supplies medical and pharmaceutical gases and turnkey solutions with gases used in industry, environmental protection, medicine, the food and beverage sector, welding and cutting technology, 3D printing, construction, and research and science. |
|
6 |
Sales Area |
Worldwide |
|
7 |
Manufacturing Location |
Germany |
|
8 |
No. of Employees |
11,259 (as of December 31, 2022) |
|
9 |
Competitors |
|
|
10 |
CEO |
Bernd Eulitz |
|
11 |
Ownership Type |
Private |
|
12 |
Contact Information |
Messer-Platz 165812 Bad Soden Tel: +49 6196 7760 200 |
Business Segment/ Overview:
Messer Group is a one of the largest privately managed specialist for industrial, medical and specialty gases. It product offering includes gases used in industry, environmental protection, medicine, the food and beverage sector, welding and cutting technology, 3D printing, construction, and research and science. Apart from these product solutions company is also engaged in providing medical and pharmaceutical gases and turnkey solutions. The etching gas segement of the company comprises of SULFUR HEXAFLUORIDE, TETRAFLUOROMETHANE and OCTAFLUOROPROPANE
High Purity Etching Gas Product Types Specification
|
Product |
Product Description |
|
SULFUR HEXAFLUORIDE |
Application: High purity SF6 is utilized in two main plasma treatment processes in the semiconductor industry: SF6 plasma etch of wafers and SF6 plasma cleaning of vacuum chambers. |
|
TETRAFLUOROMETHANE |
Application: CF4 plasma etching of wafers and CF4 plasma cleaning of vacuum chambers. In particular, the capabilities for an efficient CF4 etch process are exploited due to the high Fluorine-to-Carbon ratio (4:1) |
|
OCTAFLUOROPROPANE |
Application: C3F8 plasma etching of wafers and C3F8 plasma cleaning of vacuum chambers. Octafluoropropane can be utilized in various etch processes, e.g. for selective C3F8 plasma etching of Silicon Dioxide or as an etching agent for Reactive Ion Etching. |
Author's Detail:
Anushka Gore /
LinkedIn
Anushka Gore is a seasoned market researcher specializing in the dynamic landscape of the medical devices & consumables industry. She has dedicated herself unraveling the intricate market trends and consumer behaviors that shape the future of medical technologies and services. Her expertise in Market Research and business intelligence has equipped her with the skills necessary to analyze complex information and provide strategic recommendations.
In her current role, Anushka is a highly motivated and detail-oriented research analyst with a passion for uncovering valuable insights from data. She thrives in dynamic environments where her analytical abilities and research expertise can contribute to informed decision-making for businesses. Her collaborative approach facilitated effective communication of insights, fostering a data-driven culture within the organization.Anushka remains an invaluable asset in the dynamic landscape of market research.