SK Inc. materials Basic Information, Manufacturing Base, Sales Area, and Competitors
|
Sr. No. |
Item |
Description |
|
1 |
Company Name |
SK Inc. materials |
|
2 |
Website |
www.sk-materials.com |
|
3 |
Established Date |
1982 |
|
4 |
Headquartered |
Seoul |
|
5 |
Market Position/ History |
Established in 1982, SK Inc. is a material technology company, offering various solution including high purity etching gases. This portfolio includes monofluoromethane (CH 3 F), hexafluorobutadiene (C 4 F 6), and difluoromethane (CH 2 F 2). Started development of semiconductor wafer and SIC abrasives in 1994. Merger of SK Materials took place in 2021. |
|
6 |
Sales Area |
Worldwide |
|
7 |
Manufacturing Location |
China, Japan and Taiwan |
|
8 |
Ticker |
KRX: 034730 |
|
9 |
No. of Employees |
1,606 people (as of December 31, 2022) |
|
10 |
Competitors |
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|
11 |
CEO |
Kim Yang-taek |
|
12 |
Ownership Type |
Public |
|
13 |
Contact Information |
(03159) 22nd floor, Tower 1, Gran Seoul Building, Jongno 33, Jongno-gu, Seoul TEL02-728-0910 FAX02-728-0998 |
Business Segment/ Overview
SK Inc. is a materials technology company offering vaarious solutions in gases segment including cleaning gas, deposition gas, industrial gas, etching gas, battery material and mutiple other verticals. The company has been stably supplying highest quality gases solutions to their customers through independent technology development and preemptive investment in expansion.
The Etching gas segment comprises of :
- Hexafluoroethane C 2 F 6
- Carbon tetrafluoride C F 4
- Octafluorocyclobutane C 4 F 8
- Pentafluoroethane C 2 HF 5
- Monofluoromethane CH3F
- Butadiene hexafluoride C 4 F 6
- Difluoromethane CH 2 F 2
- Trifluoromethane CHF 3
- hydrogen bromenide HBr
The company operates with multiple subsidiary enterprises which includes:
- SK Specialty
- SK Materials Air Plus
- SK Resonac
- SK Trichem
- SK Materials Performance
- SK Materials J&C
Global High Purity Etching Gas Product Types Specification
|
Product |
Product Description |
|
Hexafluoroethane C 2 F 6 |
Application: Used for etching semiconductor micropatterns. |
|
Carbon tetrafluoride C F 4 |
Application: Used for etching oxide films. |
|
Octafluorocyclobutane C 4 F 8 |
Application: Provides high selectivity to mask and is used for 3D NAND high aspect ratio etch. |
|
Pentafluoroethane C 2 HF 5 |
Application: Used for etching oxide and nitride films. |
|
monofluoromethane CH3F |
Application: CH 3 F is a gas used to etch the nitride film of 3D NAND Flash, and its usage is increasing as 3D NAND spreads. |
|
Butadiene hexafluoride C 4 F 6 |
Application: C 4 F 6 is also used for micro-etching the oxide film of increasingly finer DRAM and oxide film etching of 3D NAND Flash |
|
difluoromethane CH 2 F 2 |
Application: CH 2 F 2 is a gas used together with CH 3 F to etch the nitride film of NAND Flash. |
|
Trifluoromethane CHF 3 |
Application: CHF 3 is used for 3D NAND Flash nitride film etching and DRAM nitride film micro-etching. |
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hydrogen bromenide HBr |
Application: HBr is a gas used in semiconductor etching processes. Due to its excellent precision/vertical etching capabilities |
Recent Developments:
|
Year |
Latest News |
|
29th June 2022 |
MoU to start cooperative work in high purity gases Showa Denko K.K. and SK Incorporated concluded a memorandum of understanding (MOU) to give consideration to a plan to start cooperative work to produce high-purity gases, which are used in semiconductor production processes, in North America. In 2017, SDK and SK Materials established a joint corporation named SK Showa Denko, Co., Ltd. which produces and sells high-purity gases for semiconductors, and, in the Republic of Korea, they cooperatively produce CH3F, which is used mainly as etching gas for silicon nitride film. |
Author's Detail:
Anushka Gore /
LinkedIn
Anushka Gore is a seasoned market researcher specializing in the dynamic landscape of the medical devices & consumables industry. She has dedicated herself unraveling the intricate market trends and consumer behaviors that shape the future of medical technologies and services. Her expertise in Market Research and business intelligence has equipped her with the skills necessary to analyze complex information and provide strategic recommendations.
In her current role, Anushka is a highly motivated and detail-oriented research analyst with a passion for uncovering valuable insights from data. She thrives in dynamic environments where her analytical abilities and research expertise can contribute to informed decision-making for businesses. Her collaborative approach facilitated effective communication of insights, fostering a data-driven culture within the organization.Anushka remains an invaluable asset in the dynamic landscape of market research.